ArF Immersion Scanner NSR-S622D
The NSR-S622D ArF immersion scanner was developed for high-volume multiple patterning applications at the sub-20 nm generation through further enhancements to the accuracy and productivity of the proven Streamlign Platform. The S622D builds upon S621D Streamlign technology, and delivers crucial enhancements to mix-and-match overlay (MMO) through improvements in lens performance and the autofocus mechanism. The S622D delivers ultra-high productivity with throughput greater than 200 wafers per hour and MMO that is 3.5 nm or less, to support chip makers' cutting-edge production lines.
| Resolution | ≦ 38 nm |
|---|---|
| NA | 1.35 |
| Exposure light source | ArF excimer laser (193 nm wavelength) |
| Reduction ratio | 1:4 |
| Maximum exposure field | 26 mm × 33 mm |
| Overlay | ≦ 2 nm (SMO*1), ≦ 3.5 nm (MMO*2) |
| Throughput | ≧ 200 wafers/hour (300 mm wafer, 125 shots) |
- *1Single machine overlay: machine-to-self overlay accuracy (NSR-S622D#1 to S622D#1)
- *2Mix and match overlay: machine-to-machine overlay accuracy (NSR-S622D#1 to NSR-S622D#2)
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