ArF Scanner NSR-S320F
Nikon recently released the NSR-S320F, which employs the Streamlign platform, to deliver enhanced overlay accuracy and significantly higher throughput for dry ArF layers. This proven platform provides simplified system setup and maintenance, and delivers optimal scanner stability to reduce cost of ownership.
Resolution | ≦ 65 nm |
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NA | 0.92 |
Exposure light source | ArF excimer laser (193 nm wavelength) |
Reduction ratio | 1:4 |
Exposure field | 26 mm × 33 mm |
Overlay | ≦ 3 nm |
Throughput | ≧ 200 wafers/hour (300 mm wafer, 125 shots) |