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Synthetic Silica Glass (SiO2)

Nikon's synthetic silica glass (NIFS series) features a homogeneous refractive index, high transmittance and superior laser durability.
The NIFS series has been developed and manufactured based on over 100 years of experience in optics.

NIFS Series Advantages

  • Internal transmittance and laser durability

    As a result of a reduction in silica glass impurities through the use of high-purity materials and optimizing the synthetic process, the NIFS series offers high transmittance and superior laser durability in the vacuum ultraviolet region.

  • Refractive index homogeneity.

    The NIFS series' high refractive index homogeneity is the result of strict control of the thermal process.

  • Large high-quality material

    High-quality material can be up to 2,000 mm square.

Applications

  • Optics for ultraviolet and high-power lasers
  • Photomask substrates for IC / LCD
  • Lens materials and optics for lithography systems
  • Lens materials and optics for inspection equipment
  • Wafers
  • Substrates for various devices (e.g. TFT, CCD, etc.)
  • Optics for astronomy
  • Optics for medical equipment
  • *Please contact us about other applications


Synthetic silica glass substrates for photomasks are also available.

Optical grades

Grade Internal transmittance [%]
Thickness:10 mm
Laser durability Striae Recommended wavelength
NIFS-V ≧ 99.9 (at 193 nm) A 3D Free ArF excimer laser (193 nm)
NIFS-A ≧ 99.9 (at 193 nm) B 3D Free
1D Free
ArF excimer laser (193 nm)
NIFS-U ≧ 99.9 (at 248 nm) C 3D Free
1D Free
KrF excimer laser (248 nm)
NIFS-S ≧ 99.9 (at 365 nm) 3D Free
1D Free
UV region, Visible region
NIFS-I   (non-optical use)
  • *Laser durability is classified into three groups, A, B and C. NIFS-V represents the highest grade.
    The optical properties of NIFS-I cannot be guaranteed.

Please see our brochure for more details