Nikon optical materials have been developed to respond to light sources for semiconductor and LCD lithography systems, for which marginal accuracy and durability are required. Through evaluation of physical properties by the latest analysis and measurement technologies, we guarantee specification properties, grades and production quality that meet the needs of our customers. In addition, building on our many years of experience, we also provide analysis and measurement services for various optical materials and optical components.
Synthetic Silica Glass (SiO2)
Synthetic silica glass (NIFS series) features a homogeneous refractive index and improved transmittance that provides superior durability to laser exposure.
Calcium Fluoride (CaF2)
Calcium fluoride (NICF series) is a single crystal that has ultrahigh purity and durability to long-term high-power laser exposure.
Optical Glass
Nikon's optical glass is a type of clear homogeneous glass that features certain optical qualities such as low wavelength dependency of transmittance and a high refractive index.
Analysis & Measurement
We provide a wide range of analysis and measurement services, including those for physical properties in the vacuum ultraviolet range, as well as fundamental chemical analysis and optical properties assessment.