5th & 6th Generation Tools with Multi-Lens Projection Optical System Start of Sales for Nikon Large-Plate Exposure Systems FX-51S/61S
September 18, 2002
To support 5th and 6th generation plate sizes for liquid crystal displays (LCD), Nikon Corporation (SHIMAMURA, Teruo, President) has developed the Large-Plate Exposure Systems FX-51S/61S.
Sales of the systems are planned to start in the spring of 2003.
The 6th generation system, FX-61S, will accommodate the world's largest plate sizes.
The FX-51S/61S systems form an image of a mask pattern and transfer that image to a glass plate in a repeating step-and-scan process. The adoption of a multi-lens projection optical system enables the efficient mass production of panels for 30-inch wide-screen TVs and contributes to improving productivity. The addition of options to both models extends applications to the fabrication of color filters.
Sales Overview
Product Name | Nikon Large-Plate Exposure Systems FX-51S/61S |
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Sales Inception | Spring 2003 |
Expected Sales Volume | Approx. 20 units in first year (2 models combined) |
Development Background
Thin film transistor (TFT) active matrix LCDs created a market for notebook computer displays, and their adoption for desktop and TV monitors has rapidly expanded that market. Global LCD sales in 2001 exceeded 2 trillion Japanese Yen, and TFT systems account for more than 70% of those sales.
With applications for 5th and 6th generation plate sizes, the Nikon Large-Plate exposure systems FX-51S/61S can efficiently mass produce 30-inch or larger wide-class panels (16:9 aspect ratio). The FX-61S can handle the largest plate sizes in the world (over 1,400 mm x 1,700 mm).
Furthermore, while rapid progress is being made on increasing monitor sizes, there are also demands for the fabrication of larger and higher resolution color filters. With the installation of a special alignment device (option), both of the new FX models have applications for these color filters. The models will contribute to improving the efficiency of mix-and-match in the color filter formation process.
The start of FX-51S/61S sales signals the expansion of the FX line-up for large plate sizes, color filters, and low temperature polysilicon TFTs, enabling Nikon to meet the diverse needs of panel manufacturers.
Main Features
- Newly Developed Multi-Lens Projection Optical System Installed
The system has a newly developed multi-lens projection optical system, which consists of 7 projection lenses. This new system enables up to 36-inch wide-class (16:9) and 40-inch (4:3) displays to be printed in a single scan exposure.
- Note: Multi-lens exposure optical system: Enables high productivity for large high definition LCDs. In the future, it will be possible to have applications for even larger plate sizes by increasing the number of projection lenses, providing an advantage for the development of the next generation tool.
- Application for Color Filter Fabrication
With the installation of a special alignment device (option), both new FX models have applications to fabricate color filters, which require large sizes and higher definition.
- Throughput Dramatically Improved by Extended Exposure Field
FX-51S (1,200 mm x 1,300 mm):832 plates/hr. (15-inch panels), 624 plates/hr. (17- and 18-inch panels)
FX-61S (1,400 mm x 1,700 mm): 408 plates/hr. (30-inch wide panels), 204 plates/hr. (36-inch wide panels) - Large Plate Applications
The new models have applications for large 5th and 6th generation plate sizes. It is possible to fabricate at maximum the following number of panels from one glass plate:
FX-51S (1,200 mm x 1,300 mm):16 panels (15-inch), 12 panels (17- and 18-inch)
FX-61S (1,400 mm x 1,700 mm): 8 panels (30-inch wide), 4 panels (36-inch wide) - Wide Exposure Field and High Resolution Simultaneously Achieved
With the multi-lens projection optical system installed, a wide exposure field is assured and a high resolution of 3 um or less (L/S) is maintained just as with the wellestablished stepper exposure system. The system will also be fully applicable for LCDs with even higher definition requirements.
Main Specifications
Resolution (L/S) (Switchable) |
3 µm (i-line) 3.5 µm (g+h+i-line) |
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Projection Magnification | 1:1 |
Alignment Accuracy | 0.6 µm or less (3s) |
Maximum Plate Size | 1,300mm x 1,300mm (FX-51S) over 1,400mm x 1,700mm (FX-61S) |
Mask Size | 800mm x 920mm Thickness: 10mm (Standard) 800mm x 520mm Thickness: 10mm (Small mask) |
Throughput | 67sec./plate (FX-51S) 70sec./plate (FX-61S) Conditions: 4scans, g+h+i-line, 30mJ/cm2 |
- The information is current as of the date of publication. It is subject to change without notice.